Nitride semiconductor light emitting device

ABSTRACT

The invention provides a highly reliable nitride semiconductor light emitting device improved in electrostatic discharge withstand voltage. In the light emitting device, an n-type nitride semiconductor layer, an active layer and a p-type nitride semiconductor layer are sequentially formed on a substrate. The active layer features a multiple quantum well structure including a plurality of multiple quantum barrier layers and quantum well layers. At least one of the quantum barrier layers has a band-gap modulated multilayer structure.

RELATED APPLICATION

This application claims the benefit of Korean Patent Application No.2005-97623 filed on Oct. 17, 2005 in the Korean Intellectual PropertyOffice, the disclosure of which is incorporated herein by reference.

BACKGROUND OF THE INVENTION

1. Field of the Invention

The present invention relates to a nitride semiconductor light emittingdevice, more particularly, which is highly resistant to ElectrostaticDischarge (ESD).

2. Description of the Related Art

Recently, a group III-V nitride semiconductor (hereinafter “nitridesemiconductor”) has been broadly used as a light emitting diode (LED)for emitting blue or green wavelength light or a semiconductor materialfor a laser diode (LD). The nitride semiconductor also has foundapplications as a light source of various products such as natural colordisplay boards, traffic lights, image scanners and lighting devices.Here the nitride semiconductor device denotes a GaN-based semiconductormaterial having a composition expressed by In_(x)Al_(y)Ga_(1-x-y)N,where 0≦x≦1, 0≦y≦1 and 0≦x+y≦1. In utilizing this nitride semiconductordevice, greater significance has been imparted not only to lightemitting capability but also reliability thereof. The nitridesemiconductor light emitting device is typically susceptible toElectrostatic Discharge (ESD), especially reverse ESD. Thus ESDwithstand voltage of the light emitting device is a determinant factorof reliability.

Various studies have been conducted to suppress ESD-induced damage tothe nitride semiconductor light emitting device. For example, in aconventional method, a GaN-based LED is connected in parallel to aSi-based zener diode to prevent the light emitting device from ESD.However, such a method requires a separate zener diode to be bonded andassembled, thereby considerably increasing material and process costsand hampering miniaturization thereof. In another conventional method,U.S. Pat. No. 6,593,597 discloses a technology of integrating an LEDdevice and a Schottky diode on the same substrate and connecting them inparallel with each other to protect the light emitting device from ESD.

FIG. 1 is a cross-sectional view illustrating a conventional nitridesemiconductor light emitting device having a Schottky diode installedtherein. Referring to FIG. 1, the light emitting device (LED) includesbuffer layers 12 a and 12 b, a first n-type nitride semiconductor layer14 a, an active layer 18, a p-type nitride semiconductor layer 22, atransparent electrode 24 and an n-electrode 26 formed sequentially on asapphire substrate 11. Also, the Schottky diode is formed separate fromthe LED structure on the sapphire substrate 11. The Schottky diodeincludes a second n-type nitride semiconductor layer 14 b, a Schottkycontact electrode 28 and an ohmic contact electrode 30.

The transparent electrode of the LED structure is connected to the ohmiccontact electrode 30 and the n-electrode 26 of the LED structure isconnected to the Schottky contact electrode 28. Accordingly, the LEDstructure is connected in parallel to the Schottky diode. In the lightemitting device structured above, reverse ESD applied may be dischargedthrough the Schottky diode. Therefore, with the reverse ESD voltageapplied, most current flows through the Schottky diode in place of theLED diode, shielding the LED structure from ESD.

Yet, this method for shielding ESD via the Schottky diode cumbersomelyrequires a separate Schottky contact to be made, increasingmanufacturing costs of the device. That is, the LED device area shouldbe separated from the Schottky diode area. Moreover, an electrodematerial for forming the Schottky contact and an electrode material forforming an ohimic contact should be deposited separately on the secondn-type nitride semiconductor 14 b made of an n-type GaN-based material.

SUMMARY OF THE INVENTION

The present invention has been made to solve the foregoing problems ofthe prior art and therefore an object according to certain embodimentsof the present invention is to provide a nitride semiconductor lightemitting device having a stronger ESD withstand voltage through animproved LED multilayer structure.

According to an aspect of the invention for realizing the object, thereis provided a nitride semiconductor light emitting device including: ann-type nitride semiconductor layer, an active layer and a p-type nitridesemiconductor layer sequentially formed on a substrate, wherein theactive layer comprises a multiple quantum well structure including aplurality of quantum barrier layers and quantum well layers, and whereinat least one of the quantum barrier layers has a band-gap modulatedmultilayer structure.

According to the invention, the multilayer structure has a compositionexpressed by In_(x)Al_(y)Ga_(1-x-y)N, where 0≦x≦1, 0≦y≦1 and 0≦x+y≦1.The multilayer structure comprises multiple layers, at least some ofwhich are n-doped. The multilayer structure comprises multiple layersdoped with different concentrations. Preferably, the multilayerstructure comprises multiple layers each having a thickness ranging from0.2 nm to 5 nm.

According to an embodiment of the invention, the multilayer structurecomprises two types of layers with different band gaps, the two types oflayers stacked repeatedly. The two types of layers with different bandgaps have different compositions.

The multilayer structure comprises first nitride semiconductor layerswith a first band gap and second nitride semiconductor layers with asecond band gap smaller than the first band gap, the first and secondsemiconductor layers stacked alternately, the first nitridesemiconductor layers having a composition expressed byIn_(x)Al_(y)Ga_(1-x-y)N, where 0≦x≦1, 0≦y≦1 and 0≦x+y≦1 and the secondnitride semiconductor layers having a composition expressed byIn_(m)Al_(n)Ga_(1-m-n)N, where 0≦n≦1, 0≦m≦1 and 0≦m+n≦1. For example,the multilayer structure comprises first and second layers withdifferent band gaps, the first and second layers stacked alternately,the first layers having a composition expressed by In_(x)Ga_(1-x)N,where 0≦x<1 and the second layers having a composition expressed byIn_(m)Ga_(1-m)N, where 0<m≦1 and x<m.

At least one type of the first and second nitride semiconductor layershas compositional change. For example, the second nitride semiconductorlayers are made of InGaN, an In content increased by proximity to thep-type nitride semiconductor layer. On the contrary, the second nitridesemiconductor layers are made of InGaN, In content decreased byproximity to the p-type nitride semiconductor layer.

According to another embodiment of the invention, the multilayerstructure comprises at least two stacks of layer groups, each of thelayer groups including at least two layers with different band gaps.Here, the layer groups are doped with different concentrations. Also,the layer groups have band-gaps modulated differently.

For example, the multilayer structure comprises at least two stacks oflayer groups, each of the layer groups including a first nitridesemiconductor layer having a first band gap, a second nitridesemiconductor layer having a second band gap smaller than the first bandgap and a third semiconductor layer having a third band gap smaller thanthe second band gap.

According to a preferred embodiment of the invention, the multilayerstructure is disposed only in one or two of the quantum barrier layersadjacent to the n-type nitride semiconductor layer, the one or twoquantum barrier layers interleaved between the quantum well layers.Here, the active layer may start either from the quantum well layer orfrom the quantum well layer on a top surface of the n-type nitridesemiconductor layer.

According to further another embodiment of the invention, at least twoof the quantum barrier layers each has a band-gap modulated multilayerstructure, and the multilayer structures of the at least two quantumbarrier layers are identical with each other. Alternatively, at leasttwo of the quantum barrier layers each has a band-gap modulatedmultilayer structure, wherein the multilayer structures of the at leasttwo quantum barrier layers are different from each other. For example,the at least two quantum barrier layers with the multilayer structureshave different compositions or are band-gap modulated differently.

According to the invention, some quantum barrier layers with an activelayer are constructed of a band-gap modulated multilayer structure,thereby achieving stronger current spreading effect. This currentspreading effect prevents current from being crowded locally andenhances properties of electrostatic discharge withstand voltage. In theend, the invention obviates a need for bonding a separate stackstructure, zener diode or Schottky diode but sufficiently shields theLED device from ESD, thus advantageously simplifying a manufacturingprocess and reducing manufacturing costs.

BRIEF DESCRIPTION OF THE DRAWINGS

The above and other objects, features and other advantages of thepresent invention will be more clearly understood from the followingdetailed description taken in conjunction with the accompanyingdrawings, in which:

FIG. 1 is a cross-sectional view illustrating a conventional nitridesemiconductor device;

FIG. 2 is a cross-sectional view illustrating a nitride semiconductorlight emitting device according to an embodiment of the invention;

FIG. 3 is a cross-sectional view illustrating a nitride semiconductordevice according to another embodiment of the invention;

FIG. 4 is a cross-sectional view illustrating a nitride semiconductorlight emitting device according to further another embodiment of theinvention;

FIGS. 5 to 8 are conduction band edge diagrams of an active layer forschematically explaining a multiple quantum well structure of the activelayer according to various embodiments of the invention;

FIG. 9 is a graph illustrating concentration distribution of electronsand holes in the active layer;

FIG. 10 is a graph illustrating recombination efficiency in the activelayer; and

FIG. 11 is a graph illustrating optical power and ESD withstand voltagein accordance with the number of quantum barrier layers constructed of amultilayer structure.

DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENT

The present invention now will be described more fully hereinafter withreference to the accompanying drawings, in which preferred embodimentsof the invention are shown. This invention may, however, be embodied inmany different forms and should not be construed as limited to theembodiments set forth herein. Rather, these embodiments are provided sothat this disclosure will be thorough and complete, and will fullyconvey the scope of the invention to those skilled in the art. In thedrawings, the shapes and dimensions may be exaggerated for clarity, andthe same reference signs are used to designate the same or similarcomponents throughout.

FIG. 2 is a cross-sectional view illustrating a nitride semiconductorlight emitting device according to an embodiment of the invention.Referring to FIG. 2, the light emitting device 100 includes an n-typenitride semiconductor layer 103, an active layer 120 and a p-typenitride semiconductor layer 130 sequentially formed on a substrate 101of e.g. sapphire. An electrode structure of the light emitting device100 is not illustrated for the sake of convenience. The active layer 120is constructed of a multiple quantum well structure. That is, the activelayer includes quantum well layers 105 a, 105 b, 105 c and 105 d andquantum barrier layers 112 and 110 stacked alternately. Moreover, atleast one 112 of the quantum barrier layers 112 and 110 has a band-gapmodulated multilayer structure. FIG. 5 to FIG. 8 illustrate exemplaryenergy band structures of the active layer including the quantum barrierlayer 112 constructed of a band-gap modulated multilayer structure.

According to the invention, the at least one 112 quantum barrier layer112 in the active layer 120 features the band-gap modulated multilayerstructure, thereby further ensuring current to spread laterally. Thiscurrent spreading effect prevents current from being crowded locally andthe light emitting device from suffering damage from ESD. Thisaccordingly improves ESD withstand voltage of the nitride semiconductorlight emitting device 100 without a separate zener diode or Schottkycontact.

As shown in FIG. 2, the multilayer structure is disposed in the quantumbarrier layer 112 which is in the closest vicinity of the n-type nitridesemiconductor layer 103 out of the quantum barrier layers 112 and 110interleaved between the quantum well layers. In general, preferably, thequantum barrier layer of the band-gap modulated multilayer structure isinserted between the quantum well layers. Especially, the multilayerstructure is disposed only in one or two quantum barrier layersinterleaved between the quantum well layers. This enhances electrostaticwithstand voltage and prevents degradation in brightness.

In a further explanation, typically, in the active layer, electrons aremuch more concentrated and mobile than holes. Consequently,electron-hole recombination, particularly, radiative recombination forlight emission, mostly occurs in the well layer which is adjacent to thep-type nitride semiconductor layer 130. That is, proximity to an n-side(i.e. the n-type nitride semiconductor layer 103) significantly reducesradiative recombination. This is confirmed by graphs of FIGS. 9 and 10.FIG. 9 is a graph illustrating concentration distribution of electronsand holes in the active layer and FIG. 10 is a graph illustratingrecombination rate distribution in the active layer.

As shown in FIG. 9, generally, electrons are more populated than holesin the active layer. Also, in the quantum well layers, electrons arepresent at a similar concentration. On the other hand, since holes aresignificantly less mobile than electrons, most holes are present in oneof the quantum well layers, which is in the close vicinity of a p-side(i.e. the p-type nitride semiconductor layer). Also, proximity to then-side (i.e. the n-type nitride semiconductor layer) steeply decreasesconcentration of holes. Accordingly, as shown in FIG. 10, radiativerecombination mostly arises in the quantum well layer close to thep-type nitride semiconductor layer (p-side).

In this fashion, radiative recombination mostly takes place in thequantum well layer adjacent to the p-type nitride semiconductor layer.As a result, even when the quantum barrier layer in the close vicinityof the n-type nitride semiconductor layer (n-side) is constructed of theband-gap modulated multilayer structure, electrostatic dischargewithstand voltage is effectively improved without noticeable decrease inlight emitting efficiency and brightness.

The barrier layer 112 of the multilayer structure is made of asemiconductor material having a composition expressed byIn_(x)Al_(y)Ga_(1-x-y)N, where 0≦x≦1, 0≦y≦1 and 0≦x+y≦1. The multilayerstructure includes multiple layers, at least some of which are n-doped.This n-doping increases electrical conductivity and reduces operationvoltage thereof. Here, the multiple layers each are doped with equal ordifferent concentrations. Alternatively, some of the multiple layers aredoped with equal concentrations and others are doped with differentconcentrations. Especially, the barrier layer may be constructed of themultilayer structure having high-doped and low-doped multilayer layersstacked alternately, thereby boosting current spreading effect further.

The multiple layers of the multilayer structure 112 each have an equalor different thickness. Preferably, the multiple layers of themultilayer structure 112 each have a thickness ranging from 0.2 nm to 5nm. More preferably, the multiple layers of the multilayer structure 112each have a thickness ranging from 0.5 nm to 5 nm.

In the embodiment of FIG. 2, the active layer begins from the quantumwell layer 105 a on the n-type nitride semiconductor layer. But theinvention is not limited thereto. The active layer may start from thequantum barrier layer on the n-type nitride semiconductor layer.

FIGS. 3 and 4 are cross-sectional views illustrating a nitridesemiconductor light emitting device according to other embodiments ofthe invention. In the light emitting device 200 and 300 of FIGS. 3 and4, an active layer 140 and 150 starts from a quantum barrier layer on ann-type nitride semiconductor layer 103. In the nitride semiconductordevice 200, quantum barrier layers 110 and 113 are inserted betweenquantum well layers 105 a, 105 b, 105 c and 105 d. Here, especially,only one quantum barrier layer 113 adjacent to the n-type nitridesemiconductor layer 103 is constructed of a band-gap modulatedmultilayer structure. Likewise, in the nitride semiconductor lightemitting device 300 of FIG. 4, quantum barrier layers 110, 114 and 115are interleaved between quantum well layers 105 a, 105 b, 105 c, 105 cand 105 d. But, here, only two quantum barrier layers 114 and 115adjacent to an n-type nitride semiconductor layer 103 are constructed ofa band-gap modulated multilayer structure.

As in the light emitting device 400 of FIG. 4, in a case where at leasttwo quantum barrier layers 114 and 115 feature a multilayer structure,multilayer structures of the quantum barrier layers 114 and 115 areidentical with each other. Alternatively, the multilayer structures ofthe quantum barrier layers 114 and 115 are different from each other inview of strains in the multilayer structure. For example, the quantumbarrier with the multilayer structures 114 and 115 have differentcompositions or are band-gap modulated differently.

FIGS. 5 to 8 are conduction band edge diagrams of an active layeraccording to various embodiments of the invention. FIGS. 5 to 8illustrate exemplary energy band structures of a quantum barrier layerconstructed of a multilayer structure.

First, referring to FIG. 5, the multilayer structure has at least twotypes of layers with different band gaps stacked repeatedly. To obtainthe quantum barrier layer of the multilayer structure in FIG. 5, firstnitride semiconductor layers having a first band gap and second nitridesemiconductor layers having a second band gap greater than the firstband gap are stacked alternately with each other. Here, the firstnitride semiconductor layers have a composition expressed byIn_(x)Al_(y)Ga_(1-x-y)N, where 0≦x≦1, 0≦y≦1 and 0≦x+y≦1 and the secondnitride semiconductor layer have a composition expressed byIn_(m)Al_(n)Ga_(1-m-n)N, where 0≦n≦1, 0≦m≦1 and 0≦m+n≦1. For example,layers having a composition expressed by In_(x)Ga_(1-x)N, where 0≦x<1and layers having a composition expressed by In_(m)Ga_(1-m)N, where0<m≦1 and x<m are stacked alternately with each other. This produces theband-gap modulated multilayer structure in FIG. 5. Here, out ofIn_(x)Ga_(1-x)N, and In_(m)Ga_(1-m)N, the In_(m)Ga_(1-m)N layer has ahigher In content, thereby exhibiting a smaller band gap.

Referring to FIG. 6, a quantum barrier layer of a multilayer structureincludes first and second nitride semiconductor layers with differentband gaps (the first nitride semiconductor layers have a band gapgreater than the second nitride semiconductor layers). The first andsecond layers are stacked repeatedly. Here, the second nitridesemiconductor layers may be changed in their composition such that aband gap of the second nitride semiconductor layers is decreased byproximity to the p-side (toward the p-type semiconductor layer). Forexample, the second nitride semiconductor layers are constructed of anInGaN layer, in which In content is increased by proximity to thep-side.

As shown in FIG. 7, the second nitride semiconductor layers are changedin their composition such that the band gap thereof is increased byproximity to the p-side, as opposed to FIG. 6. For example, the secondnitride semiconductor layers are made of InGaN, in which In content isdecreased by proximity to the p-side. Alternatively, the first nitridesemiconductor layers may have compositional change. In this fashion, atleast one type of the first and second nitride semiconductor layers ofthe multilayer structure may have compositional change, which is nothowever limited to the examples of FIG. 5 to 7.

FIG. 8 is an energy band structure diagram illustrating a quantumbarrier layer of a multilayer structure according to further anotherembodiment of the invention. Referring to FIG. 8, the multilayerstructure includes at least two stacks of layer groups. Here, each ofthe layer groups includes three layers with different band gaps (firstto third nitride semiconductor layers).

In a more specific explanation, the multilayer structure includes atleast two stacks of layer groups. Here, each of the layer groupsincludes the first nitride semiconductor layer having a first band gap,the second nitride semiconductor layer having a second band gap and athird nitride semiconductor layer having a third band gap (where thefirst band gap>the second band gap>the third band gap). Especially, inthe embodiment of FIG. 8, the the layer groups each are band-gapmodulated equally. Yet the invention is not limited thereto and thelayer groups each may be band-gap modulated differently. Furthermore,the layer groups each may have different compositions (i.e. cyclicallyunrepeated composition).

Also in the embodiment of FIG. 8, the quantum barrier layers of themultilayer structure are at least partially n-doped. Here, the layergroups each are doped with either equal or different concentrations.Alternatively, some of the layer groups are doped with equalconcentrations and the others are doped with different concentrations.For example, doped and undoped ones of the layer groups may stackalternate each other. In this embodiment, one layer group of themultilayer structure includes three nitride semiconductor layers withdifferent band gaps but may include two or at least four nitridesemiconductor layers with different band gaps.

According to the invention, some of the quantum barrier layers(preferably, one or two of the quantum barrier layers adjacent to then-type nitride semiconductor layer) are constructed of the band-gapmodulated multilayer structure, thereby remarkably enhancing propertiesof ESD withstand voltage properties without impairing brightness andlight emitting efficiency. This advantage is well manifested in thegraph illustrated in FIG. 11.

Referring to FIG. 11, with increase in the number of quantum barrierlayers having the band-gap modulated multilayer structure, which arestacked from the closest vicinity of the n-type nitride semiconductorlayer (also interposed between the quantum well layers), optical power(brightness) is gradually declined, while ESD withstand voltage isdrastically increased and slightly decreased. The optical power isdecreased as the quantum barrier layers of the multilayer structure aredisposed closer to the p-side. This is because radiative recombinationmostly occurs in the quantum well layer adjacent to the p-type nitridesemiconductor layer.

A graph of FIG. 11 confirms that ESD withstand voltage can be increasedby employing the quantum barrier layer constructed of a band-gapmodulated multilayer structure. Moreover, the multilayer structure isdisposed only in one or two of the quantum barrier layers adjacent tothe n-type nitride semiconductor layer out of the quantum barrier layersinterleaved between the quantum well layers. This noticeably preventsdecline in brightness. Therefore, the multilayer structure disposed onlyin one or two of the quantum barrier layers adjacent to the n-side (seeFIGS. 2 to 4) ensures adequate brightness and improves properties of ESDwithstand voltage.

However, if all the quantum barrier layers including the one adjacent tothe p-side feature the band-gap modulated multilayer structure,brightness is reduced. That is, since the band gap-modulated multilayerstructure is disposed near the quantum well layers where radiativerecombination mostly arises, light emitting efficiency is degraded.Therefore, the band-gap modulated multilayer structure should bedisposed in only some of the quantum barrier layers. Especially, themultilayer structure should be disposed in the quantum barrier layeradjacent to the n-type nitride semiconductor layer, therebyadvantageously preventing reduction in brightness.

As set forth above, according to preferred embodiments of the invention,some of quantum barrier layers are constructed of a band-gap modulatedmultilayer structure, thereby boosting current spreading effect and ESDwithstand voltage. Furthermore, the invention enhances ESD withstandvoltage easily without a separate zener diode or Schottky contact,thereby manufacturing a highly reliable nitride semiconductor lightemitting device at lower costs.

1. A nitride semiconductor light emitting device comprising: an n-typenitride semiconductor layer, an active layer and a p-type nitridesemiconductor layer sequentially formed on a substrate, wherein theactive layer comprises a multiple quantum well structure including aplurality of quantum barrier layers and quantum well layers, and whereinat least one of the quantum barrier layers has a band-gap modulatedmultilayer structure.
 2. The nitride semiconductor light emitting deviceaccording to claim 1, wherein the multilayer structure has a compositionexpressed by In_(x)Al_(y)Ga_(1-x-y)N, where 0≦x≦1, 0≦y≦1 and 0≦x+y≦1. 3.The nitride semiconductor light emitting device according to claim 1,wherein the multilayer structure comprises multiple layers, at leastsome of which are n-doped.
 4. The nitride semiconductor light emittingdevice according to claim 1, wherein the multilayer structure comprisesmultiple layers doped with different concentrations.
 5. The nitridesemiconductor light emitting device according to claim 1, wherein themultilayer structure comprises multiple layers each having a thicknessranging from 0.2 nm to 5 nm.
 6. The nitride semiconductor light emittingdevice according to claim 1, wherein the multilayer structure comprisestwo types of layers with different band gaps, the two types of layersstacked repeatedly.
 7. The nitride semiconductor light emitting deviceaccording to claim 6, wherein the two types of layers with differentband gaps have different compositions.
 8. The nitride semiconductorlight emitting device according to claim 6, wherein the multilayerstructure comprises first nitride semiconductor layers with a first bandgap and second nitride semiconductor layers with a second band gapsmaller than the first band gap, the first and second semiconductorlayers stacked alternately, the first nitride semiconductor layershaving a composition expressed by In_(x)Al_(y)Ga_(1-x-y)N, where 0≦x≦1,0≦y≦1 and 0≦x+y≦1 and the second nitride semiconductor layers having acomposition expressed by In_(m)Al_(n)Ga_(1-m-n)N, where 0≦n≦1, 0≦m≦1 and0≦m+n≦1.
 9. The nitride semiconductor light emitting device according toclaim 8, wherein the multilayer structure comprises first and secondlayers with different band gaps, the first and second layers stackedalternately, the first layers having a composition expressed byIn_(x)Ga_(1-x)N, where 0≦x<1 and the second layers having a compositionexpressed by In_(m)Ga_(1-m)N, where 0<m≦1 and x<m.
 10. The nitridesemiconductor light emitting device according to claim 8, wherein atleast one type of the first and second nitride semiconductor layers hascompositional change.
 11. The nitride semiconductor light emittingdevice according to claim 10, wherein the second nitride semiconductorlayers are made of InGaN, In content increased by proximity to thep-type nitride semiconductor layer.
 12. The nitride semiconductor lightemitting device according to claim 10, wherein the second nitridesemiconductor layers are made of InGaN, In content decreased byproximity to the p-type nitride semiconductor layer.
 13. The nitridesemiconductor light emitting device according to claim 1, wherein themultilayer structure comprises at least two stacks of layer groups, eachof the layer groups including at least two layers with different bandgaps.
 14. The nitride semiconductor light emitting device according toclaim 13, wherein the layer groups are doped with differentconcentrations.
 15. The nitride semiconductor light emitting deviceaccording to claim 13, wherein the layer groups have band-gaps modulateddifferently.
 16. The nitride semiconductor light emitting deviceaccording to claim 13, wherein the multilayer structure comprises atleast two stacks of layer groups, each of the layer groups including afirst nitride semiconductor layer having a first band gap, a secondnitride semiconductor layer having a second band gap smaller than thefirst band gap and a third semiconductor layer having a third band gapsmaller than the second band gap.
 17. The nitride semiconductor lightemitting device according to claim 1, wherein the multilayer structureis disposed only in one or two of the quantum barrier layers adjacent tothe n-type nitride semiconductor layer, the one or two quantum barrierlayers interleaved between the quantum well layers.
 18. The nitridesemiconductor light emitting device according to claim 1, wherein atleast two of the quantum barrier layers each has a band-gap modulatedmultilayer structure, and wherein the multilayer structures of the atleast two quantum barrier layers are identical with each other.
 19. Thenitride semiconductor light emitting device according to claim 1,wherein at least two of the quantum barrier layers each has a band-gapmodulated multilayer structure, wherein the multilayer structures of theat least two quantum barrier layers are different from each other. 20.The nitride semiconductor light emitting device according to claim 19,wherein the at least two quantum barrier layers with the multilayerstructures have different compositions or are band-gap modulateddifferently.